Laser processing of thin films and microstructures

oxidation, deposition, and etching of insulators by Ian W. Boyd

Publisher: Springer-Verlag in Berlin, New York

Written in English
Cover of: Laser processing of thin films and microstructures | Ian W. Boyd
Published: Pages: 320 Downloads: 130
Share This

Subjects:

  • Lasers -- Industrial applications.

Edition Notes

StatementIan W. Boyd.
SeriesSpringer series in materials science ;, 3, Springer series in materials science ;, v. 3.
Classifications
LC ClassificationsTA1677 .B69 1987
The Physical Object
Paginationviii, 320 p. :
Number of Pages320
ID Numbers
Open LibraryOL2391279M
ISBN 100387179518
LC Control Number87020660

  In addition to anisotropy issues in textured thin films, another possible cause for deviation from the linearity of d ψ h k l vs sin 2 ψ plots is the presence of stress gradients along the film thickness, especially when the film thickness is on the same order as . During the laser processing, the surface microstructures are fabricated directly by controlling the motion platform with the sample, without the motion of the laser beam. The sample was irradiated by the laser beam normal to the surface, with a focus spot of about 18 μm diameter. Results. Briefly, the VO 2 thin films were grown on Al 2 O 3 () substrates by using a polymer-assisted deposition (PAD) technique as reported earl17,Different thicknesses of VO 2 films were synthesized: one set of the sample (labeled as sample Th90) had a thickness of 90 nm and the other set of the sample (labeled as sample Th) had a thickness of nm. LASER PYROLYSIS Laser-initiated gas phase synthesis methods have been developed for making powders and thin films of ceramic materials. Powders have been synthesized with crossflow and counterflow gas stream-laser beam configurations and with both static and .

  Femtosecond laser sintering of metal nanoparticles for fabricating thin metal films/patterns has drawn substantial attention owing to its potential in fabrication of thin-film electrodes in various applications. In such applications, the electrical conductivity and the adhesion strength of the sintered film need to be optimized by forming desired microstructures. Photovoltaics Laser processing of thin-film solar modules. About Photovoltaics. LPKF, Your partner for laserstructuring. LPKF Allegro Series: 24/7 production systems. are available for the implementation of thin glass substrates with deep microstructures in your projects. CiteScore: ℹ CiteScore: CiteScore measures the average citations received per peer-reviewed document published in this title. CiteScore values are based on citation counts in a range of four years (e.g. ) to peer-reviewed documents (articles, reviews, conference papers, data papers and book chapters) published in the same four calendar years, divided by the number of.   It was found that the laser-induced damage threshold (LIDT) would be affected by the microstructure, optical loss, and stress of the thin film. To obtain a larger LIDT value and better optical characteristics, MgF2 films should be deposited at a high substrate temperature ( degrees C) and at a low deposition rate ( nm s(-1)).

Laser processing, for which the fibre geometry is particularly well suited, as established in the case of conventional glass fib34,35, combines a small heat zone and large thermal gradients with fine motion and temperature control. The cylindrical geometry, with a large surface to volume ratio, allows efficient convective cooling and. This particularly gentle type of subtractive laser material processing can be used for processes such as structuring, ablation, drilling, cutting or selective thin-film removal. These processes can be applied in various sectors such as aerospace, automotive, precision mechanics, electronics, display technology, the consumer market as well as. I, Chu, H. Y, Kim, H. R. Ultrafast laser ablation of indium tin oxide thin films for organic light-emitting diode application. Optics and Lasers in Engng, , – - Laser crystallization of Thin Si films - Laser crystallization of semiconductor nanostructures for active photonics The process is captured up until 66 nanoseconds after ablation. In-Situ SEM - Microindentation of architected microstructures. Pulsed laser conversion of an a-Si precursor into a single nano crystal inside a TEM.

Laser processing of thin films and microstructures by Ian W. Boyd Download PDF EPUB FB2

About this book Introduction This text aims at providing a comprehensive and up to date treatment of the new and rapidly expanding field of laser pro­ cessing of thin films, particularly, though by no means exclu­ sively, of recent progress in the dielectrics area.

About this Textbook. About this Textbook. This text aims at providing a comprehensive and up to date treatment of the new and rapidly expanding field of laser pro­ cessing of thin films, particularly, though by no means exclu­ sively, of recent progress in the dielectrics area.

The volume covers all the major aspects of laser processing technology in general, from the background and history to its many. Laser processing of thin films and microstructures. Berlin ; New York: Springer-Verlag, © (OCoLC) Material Type: Internet resource: Document Type: Book, Internet Resource: All Authors / Contributors: Ian W Boyd.

Laser-Assisted Fabrication of Thin Films and Microstructures Ian W. Boyd Chair/Editor Masamitsu Haruna Hubert Jerominek Vitaly I. Konov Gary L. Laser processing of thin films and microstructures book Martin C.

Peckerar Dennis L. Polla Cochairs August Quebec, Canada Sponsored and Published by SPIE—The International Society for Optical Engineering Cosponsored by.

Laser growth and processing of photonic devices is the first book to review this increasingly important field. Part one investigates laser-induced growth of materials and surface structures, with pulsed laser deposition techniques, the formation of nanocones and the fabrication of periodic photonic microstructures explored in detail.

After laser processing by LIFT (laser fluence: mJ/cm 2; diameter of spheres is 5 μm, covered by 30 nm thick Ag film), the silicon wafer used as receiver substrate is covered in nanodroplets, randomly printed throughout the surface, and similar behavior is observed when using spheres in the range of 1–5 μm.

This book gives an overview of the fundamentals and applications of laser-matter interactions, in particular with regard to laser material processing. Special attention is given to laser-induced physical and chemical processes at gas-solid, liquid-solid, and solid-solid interfaces. Chapter 2 THIN FILM DEPOSITION TECHNIQUES, ANODIZATION OF IMPLANTS AND CHARACTERIZATION TOOLS USED Bulk Microstructures and Mechanical Properties, Handbook of Deposition Technologies for Films and Coatings, Noyes PublicationsMill Road, Park Ridge, New JerseyJ.

Collins- Laser and Electron Beam Assisted Processing, Handbook of. named for the majority of the processing steps, the technology could probably be more accurately described as thin-film technology. Consistent with this change, the processing for the deposition and patterning of films has received major research and engineering emphasis and has evolved rapidly over the last few decades.

Where in the ’60’s. Microstructures and mechanical properties of CoCrFeNiAl high-entropy alloy thin films by pulsed laser deposition. maintaining the percentage of each element in the thin film nearly equal to the target during the depositing process is vital for the precise preparation of the HEATFs.

Moreover, the energy source is out of the vacuum. "Through its focus on practical aspects and its didactic approach, the book is designed especially for practitioners. It can be highly recommended to materials engineers, physicists or process engineers who work or plan to work in the still exciting field of micro electronics." (European Society of Thin Films).

microstructures in a-Si:H thin films through femtosecond laser processing in air, and showed that the nano-sizes spikes resulted in strong light absorption.

However, the light trapping geometry for a-Si:H surfaces has not been estimated for different processing. Bijoy Bhattacharyya, Biswanath Doloi, in Modern Machining Technology, Advantages and challenges.

Laser micromachining is a versatile process and is used widely for machining plastic, glass, metal as well as preparing thin foils.

The process comprises different mechanisms like cutting, drilling, marking, turning, threading, etc. In many cases thin film processing is a 2-step process involving deposition of the film followed by heat treatment. The most common deposition techniques are printing (e.g.

inkjet, screen printing) for wet chemical (nanoparticle) materials and plasma processes. Typical film thicknesses are in the range of to some microns. Pulsed-laser deposition (PLD) (Eason, ) is a relatively new physical vapour deposition technique, which has nevertheless been used for deposition of a vast range of materials including CHG thin PLD, laser pulses of high-energy density are focused onto a target, the material of which is vaporized after the laser power reaches the ablation threshold and forms a plasma plume.

A two-part review of research concerning block copolymer thin films is presented. The first section summarizes experimental and theoretical studies of the fundamental physics of these systems, concentrating upon the forces that govern film morphology. The role of film thickness and surface energetics on the morphology of compositionally symmetric, amorphous diblock copolymer films is.

SnO 2 nanocrystalline thin films were prepared by a spray pyrolysis method on glass substrates at,and °C. Structural, optical and electrical properties of these films were studied by X‐ray diffraction, UV–visible and four‐probe methods.

The change in electrical conductivity, band gap and optical transmittance was found to be a function of the change in lattice. Laser-based processing enables a wide variety of device configurations comprised of thin films and nanostructures on sensitive and even flexible substrates which are not possible with traditional thermal annealing schemes [].The crystallization of amorphous thin films is a critical fabrication step for enhancing the performance of thin-film transistors [2, 3] and thin-film solar cell.

Metallic thin films can be fully oxidized by focused laser beams, resulting in their optical density (OD) changing from highly absorbing to very transparent. Previous research found the laser-induced partial oxidation process allows the creation of grayscale photomasks.

This work investigates Sn/Zn, Zn/Al and In/Zn thin films, which are DC/RF-sputter deposited and then scanned by an argon ion. films among others [7,11].

Another process for introducing textures in thin films is laser melt crystallization using excimer laser irradiation. It has been shown to enhance the fiber textures in Cu, Al, Si, and GaAs films [] and through careful processing, the.

The deposition process of the composite thin films, is encoded by the formula [(LSMO)s/(NiO)s]t where ‘s’ is the number of laser shots and ‘t’ is the deposition time in minutes. The total deposition time ‘t’ is kept at 50 minutes for all composite thin films studied and only the number of laser shots ‘s’ is used to.

A 3D microstructure with microscale resolution was fabricated by the direct laser writing method. Combining with conventional sputtering technology of metallic thin films and PDMS releasing process, 3D conductive serpentine networks were developed into a wearable format.

Lasers can be used for surface modification processes (i.e., laser melting, cladding, alloying, and peening) in which the microstructure of a workpiece surface is modified through laser melting and rapid solidification of a thin layer of material (Ortiz et al., ). Herman's research concentrates on the fundamental aspects and applications of laser interactions with matter and nanoscience.

This includes properties of nanocrystals and films composed of nanocrystals, van der Waals layers, optical physics of the solid state, molecular and chemical physics, thin film processing, and optical spectroscopy.

A thin film is a layer of material ranging from fractions of a nanometer to several micrometers in thickness. The controlled synthesis of materials as thin films (a process referred to as deposition) is a fundamental step in many applications. A familiar example is the household mirror, which typically has a thin metal coating on the back of a sheet of glass to form a reflective interface.

However, conventional thin-film techniques are not suited for depositing Teflon films on microstructures. Spin coating is impossible because of the well-known insolubility of PTFE. Plasma polymerization of fluorocarbon monomers, ion beam and rf sputtering produce PTFE films that are deficient in fluorine.

Laser Processing and Chemistry gives an overview of the fundamentals and applications of laser-matter interactions, in particular with regard to laser material processing. Special attention is given to laser-induced physical and chemical processes at gas-solid, liquid-solid, and solid-solid interfaces.

The first part is to develop a sol-gel process to fabricate crack-free PZT thick films with thickness of 2 microns and area of 4 mm × 4 mm. The PZT thick film has a Pt/Ti bottom electrode and a gold top electrode.

Moreover, the PZT thick film is fabricated on a silicon cantilever, whose dimensions are 20 mm × 15 mm × mm. Abstract Polycrystalline films have wide variety of applications in which their grain structures affect their performance and reliability. Thin film growth techniques and growth conditions affect grain shapes, the distribution of grain sizes, and the distribution of the crystallographic orientations of grains.

Variations in these structural properties are affected by the conditions under which. Pulsed-laser-irradiation of thin films is a relatively novel processing route that induces melting and rapid re-solidification under extreme conditions of rapid heating-cooling cycles in thin films on amorphous substrates.

To date most studies on laser processing of thin films have focused on rapid solidification of Si and Cu thin films. Limited work has been performed on solving the efficiency and stability issues of a-Si:H simultaneously.

Surface texturing and crystallization on a-Si:H thin film can be achieved through one-step femtosecond laser processing, which can potentially alleviate the. The thin-film quality from the PLD depends on the various parameters such as wavelength of the laser, energy, ambient gas pressure, pulsed duration, and the distance of the target to the substrate.

The ablation process during the deposition may control and monitor by using laser-induced fluorescence [ 20 ], laser ablation molecular isotopic.The second part focuses on an emerging planar technology in which anisotropic microstructures are formed by oblique deposition in vacuum.

Methods for characterizing dielectric and metal films are discussed. Topics such as form birefringence, effective medium theory, anisotropic scatter and anisotropic fluid transport are discussed in detail.